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Thin
FIlm Stress Modification
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| In
this project, neutral ion-machining has been shown to alter
the contour shape of free-standing thin-film structures
by affecting their stress state. In a proof-of-concept experiment
on MEMS mirrors, it has been demonstrated that nearly perfect
planarity can be achieved with this process. Free-standing
mirrors with radii curvature measured in meters were produced
systematically. An analytical model incorporating the relevant
mechanics of the problem has been formulated by Professors
Harley Johnson at UIUC and Thomas Bifano at Boston University.
Its predictions compare well with experimental observations.
Based on this work, one could measure and modify residual
stress gradients in-process, enabling a new generation of
MEMS devices that have precisely controlled contour shapes. |
| Bifano,
T. G., Johnson,, H. T, Bierden, P. and Mali, R. K., "Elimination
of Stress-Induced Curvature in Thin-Film Structures"
J. Microelectromechanical Systems, [11], pp 592-597, 2002
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Thomas Bifano, College of Engineering, Boston University, 8
St. Mary's St., Boston, MA 02215, (617) 353-8908, tgb@bu.edu |
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